Title:	CFD for CVD
DNr:	LiU-2018-28
Project Type:	LiU Compute
Principal Investigator:	Örjan Danielsson <orjan.danielsson@liu.se>
Affiliation:	Linköpings universitet
Duration:	2018-11-08 – 2019-12-01
Classification:	10403
Keywords:

Abstract

At the Semiconductor Materials division at the Department of Physics, Chemistry and Biology (IFM) world-leading research is done on semiconductor materials having large band-gaps (e.g. SiC and GaN). In this research chemical vapor deposition (CVD) is used to deposit thin films of these materials on different substrates. The deposition of such thin films is the first stage in the production of semiconductor components, and the CVD process thus influences both the quality and final cost of the component. It is therefore desirable to increase the understanding of this process to be able to control and optimize it further. In the CVD process gases containing the desired atoms are led through a chamber heated to high temperatures. In the chamber chemical reactions occur eventually leading to a thin film with the desired properties. Thus, the process contains several interacting physical phenomena: fluid flow, heat transfer and chemical reactions. In this project we will study the CVD process by Computational Fluid Dynamics (CFD) simulations. With CFD it is possible to simultaneously simulate many of the physical phenomena that strongly interact in the CVD process. The CFD simulations will for example be used to • minimize turbulence in the fluid flow close to the substrate • optimize temperature fields and gradients • study gas-phase chemical reactions • study particle formation in the gas • study deposition reactions and distributions The software we intend to use is ANSYS-CFD. The possibility to use this software within existing liceses has been agreed upon with Matts Karlsson, IEI. The project builds on experience gained from the previous projects, LiU-2014-00036-10, LiU2015-00017-36, and LiU2017-00089-14, where it was shown that these type of simulations give valuable insights to the CVD process, but that they also require a high degree of details to give useful results. Therefore, we now request to allocate time on the cluster Sigma to run our simulations.